Atomic layer deposition of TiO2 thin film for biomedical applications

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dc.contributor.advisor Canton, Patrizia it_IT
dc.contributor.author Sagrini, Giacomo <1991> it_IT
dc.date.accessioned 2020-02-17 it_IT
dc.date.accessioned 2020-06-16T05:24:43Z
dc.date.available 2020-06-16T05:24:43Z
dc.date.issued 2020-03-06 it_IT
dc.identifier.uri http://hdl.handle.net/10579/16261
dc.description.abstract Atomic Layer Deposition (ALD) is a bottom-up process for the manufacturing of inorganic nanostructured thin films, with thickness down to a fraction of a monolayer. Thanks to its unique mechanism of growth, ALD is a powerful technique that has achieved a lot of interest. In this work, a low pressure ALD process was employed to deposit titanium dioxide (TiO2) for biomedical neuro-chips applications based on electrolyte-oxide-semiconductor field-effect transistors (EOSFET). The aim was to optimize a custom-made ALD process for the deposition of high-k dielectric TiO2 starting from titanium tetra-isopropoxide and deionized water. Dense and pinhole-free thin films were deposited by working at controlled temperature (T<300°C) and by varying the process parameters. The structure-properties correlation of the grown thin films was studied by X-Ray Diffraction, Scanning Electron Microscopy, X-Ray Photoelectron Spectroscopy, Secondary Ion Mass Spectrometry and Ellipsometry. To evaluate the functional biomedical applications of TiO2 thin films via ALD, preliminary cellular-neuronal biocompatibility in-vitro tests were explored. Moreover, to study the influence on cell attachment/adhesion and growth, the surface chemical functionality was explored by wettability analyses by using Water Contact Angle (WCA). Next, to avoid a progressive atmospheric contamination, the hydrophilicity was restored exposing the samples by UV radiation and studying the WCA variation at different exposure times. Finally, further work will test neuronal in-vitro bioactivity by neurons deposition for a possible biomedical application, for the purpose of recording electrical activity and stimulating damaged brain areas. it_IT
dc.language.iso en it_IT
dc.publisher Università Ca' Foscari Venezia it_IT
dc.rights © Giacomo Sagrini, 2020 it_IT
dc.title Atomic layer deposition of TiO2 thin film for biomedical applications it_IT
dc.title.alternative Atomic Layer Deposition of TiO2 thin film for biomedical applications it_IT
dc.type Bachelor Thesis it_IT
dc.degree.name Scienze e tecnologie dei bio e nanomateriali it_IT
dc.degree.level Laurea magistrale it_IT
dc.degree.grantor Dipartimento di Scienze Molecolari e Nanosistemi it_IT
dc.description.academicyear 2018/2019, sessione straordinaria it_IT
dc.rights.accessrights openAccess it_IT
dc.thesis.matricno 858284 it_IT
dc.subject.miur ING-IND/22 SCIENZA E TECNOLOGIA DEI MATERIALI it_IT
dc.description.note it_IT
dc.degree.discipline it_IT
dc.contributor.co-advisor it_IT
dc.date.embargoend it_IT
dc.provenance.upload Giacomo Sagrini (858284@stud.unive.it), 2020-02-17 it_IT
dc.provenance.plagiarycheck Patrizia Canton (cantonpa@unive.it), 2020-03-02 it_IT


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